90nm is often misunderstood. It is sometimes treated like a “slightly smaller 130nm,” but in practice it behaves much closer to a transition node — especially in terms of cost sensitivity, design discipline, and backend impact.
This article explains how 90nm wafer and MPW costs really work, and when MPW or full mask makes sense at this node.
90nm is commonly selected when teams need:
Typical applications include:
At 90nm, cost drivers shift compared to older nodes:
While still considered a mature planar node, 90nm is less forgiving than 130nm or 180nm — especially for first-time designs.
MPW is available at 90nm, but with more structure and limits:
90nm MPW is typically used for:
It is not ideal for highly unstable designs.
MPW makes sense at 90nm when:
Full mask becomes attractive when:
At 90nm, many teams transition to full mask earlier than they would at 130nm.
As integration increases, backend cost becomes more visible:
At this node, backend and test costs can rival wafer cost if not planned early.
MPW shuttle schedules at 90nm are:
Missing a shuttle window can add months — which may erase the economic benefit of MPW for time-critical products.
At 90nm, the key decision is not cost alone — it’s timing and design stability.
You can assess:
90nm offers a strong balance of integration and maturity, but it requires more discipline than older nodes.
MPW remains valuable, but only when:
At 90nm, cost decisions must reflect risk management, not just wafer price.