28nm is a turning point in ASIC development. It is often described as a “mature advanced node,” but in practice it represents the last node where many non-hyperscale teams can realistically operate. Beyond 28nm, ASIC economics, risk, and organizational requirements change dramatically.
This article explains what drives 28nm wafer and
40nm is often the first node where advanced-node realities become unavoidable. While still planar, 40nm introduces a level of complexity, cost sensitivity, and schedule risk that is very different from 55nm and above. As a result, cost assumptions at 40nm are frequently optimistic — especially for first-time ASIC teams.
This
55nm sits firmly in the advanced planar node category. While it is often grouped with 65nm, in practice it behaves very differently — especially in terms of cost sensitivity, schedule risk, and MPW limitations.
This article explains what drives 55nm wafer and MPW cost, and when MPW is still
90nm is often misunderstood. It is sometimes treated like a “slightly smaller 130nm,” but in practice it behaves much closer to a transition node — especially in terms of cost sensitivity, design discipline, and backend impact.
This article explains how 90nm wafer and MPW costs really work, and when
65nm represents a transition point in custom silicon. It is often the first node where cost, complexity, and risk start to rise meaningfully, while still remaining accessible for non–mega-scale ASIC projects.
Because of this, cost assumptions at 65nm are frequently wrong — especially when teams assume it behaves like
130nm sits at an important intersection between mature analog processes and more integration-friendly digital nodes. It is often chosen when designers need more density than 180nm, without the complexity of advanced nodes. Cost at 130nm is often misunderstood — especially when comparing MPW and full mask options.
This article explains